During her Ph.D. at the Eindhoven University of Technology in the Netherlands, Dr. Noemi (Leick) Marius’s research focused on developing and understanding the atomic layer deposition of atomically thin Pt-group metal systems, such as Ru, Pt, and Pd. Her first postdoctoral research at the Colorado School of Mines, on the other hand, had an emphasis on SiNx thin films. In 2017, Noemi joined the H2 storage group at NREL where her main area of research is synthesizing and testing novel host materials for H2 storage, using techniques such as atomic layer deposition and thermal programmed desorption, respectively.
Atomic layer deposition
Characterization of atomically thin films
Ph.D. Applied Physics, Eindhoven University of Technology, The Netherlands
M.S. Plasma Physics, University of Paris d’Orsay and Ecole Polytechnique, France
B.S. Applied Mathematics and Science, University of Montpellier II, France
“In situ spectroscopic ellipsometry during atomic layer deposition of Pt, Ru and Pd,” Journal of Physics D: Applied Physics (2016).
“Catalytic combustion reactions during atomic layer deposition of Ru studied using 18O2 isotope labeling,” The Journal of Physical Chemistry C (2013).
“Surface reactions during plasma-assisted atomic layer deposition of SiNx from silicon amides,” ALD Conference 2016 (2016).