Emeritus Researcher
On staff since: 1987
Phone number: 303-384-6676
Email Richard Crandall
Primary Research Interests
I am a solid-state physicist whose main research efforts involve thin-film devices. My current research interests include:
- Understanding the mechanism of metastable defect formation in a-Si and II-VI alloys
- Understanding the mechanism of charge emission and capture in wide-bandgap solids
- Understanding the elastic and thermal properties of amorphous solids
Other Affiliations
- American Physical Society, Member
- Institute of Electrical and Electronics Engineers, Inc. (IEEE), Member
- Materials Research Society, Member
- Sigma Xi, Member
Prior Work Experience
During my career, I have made contributions in many areas of solids and liquids, including:
- Understanding electron and phonon transport in semiconductors and insulators, with emphasis on photoconductivity and non-ohmic transport
- Understanding the mechanism of crystallization in colloid suspension
- Researching methods for energy storage
- Understanding the 2D system of electrons on liquid helium
- Understanding the basic mechanisms of electroluminescence in thin-film devices
- Understanding thin-film electrochromic devices
- Developing device models and introducing new techniques for understanding thin-film amorphous silicon solar cells
Before coming to NREL, I worked as a scientist at RCA Sarnoff laboratories in New Jersey.
Education
Ph.D. in Solid-State Physics from the University of Illinois.
Hobbies and Other Interests
- Reading
- Photography
- Outdoor sports such as hiking, camping, skiing, fishing, and biking
Selected Publications
Crandall, R.S. "Band-Tail Absorption in Hydrogenated Amorphous Silicon." Phys. Rev. Lett.; Vol. 44, 1980; p. 749.
Crandall, R.S. "Modeling of Thin Film Solar Cells: Uniform Field Approximation." J. Appl. Phys.; Vol. 54(12), 1983; pp. 7176x.
Crandall, R.S. "Defect Relaxation in Amorphous Silicon: Stretched Exponentials, the Meyer-Neldel Rule, and the Staebler-Wronski Effect." Phys. Rev. B; Vol. 43(5), 1991; pp. 4057- 4070.
Xiao, L.; White, B.E., Jr.; Pohl, R.O.; Iwanizcko, E.; Jones, K.M.; Mahan, A.H.; Nelson, B.N.; Crandall, R.S.; Veprek, S. "Amorphous Solid Without Low Energy Excitations." Phys. Rev. Lett.; Vol. 78, 1997; p. 4418.
Crandall, R.S. "Meyer-Neldel Rule in Charge-Trapping Metastability in p-type Hydrogenated Amorphous Silicon." Phys. Rev. B; Vol. 59, 2002; p.195210.
View a complete list of my NREL publications. |
