PIX number

14513

Title:

FEI Dual Beam Nova 200 FIB

Caption

This is a Dual Beam instrument that consists of a focused ion beam (FIB) column and a scanning electron microscope (SEM) column on the same platform. It is used for ion milling, metal deposition, ion imaging and electron imaging on the micrometer and nanometer scale of advanced PC materials and devices. In support of other analytical tools such as TEM, the dual beam FIB is used to perform precise site-specific sample preparation for both TEM and SEM. The acquisition of chemical spectra and chemical maps is another feature of this system with energy dispersive spectroscopy (EDS). By combining controlled ion milling with chemical mapping 3D chemical reconstructions are attainable. The FIB is also equipped with a gas injection system (GIS) Pt metal deposition capability that can be used in conjunction with either ion beam assisted or electron beam assisted chemical vapor deposition. Utilizing a digital pattering generator also allows for complete FIB milling or deposition of complex structures with software supplied parameters and/or by direct input of bit map file.

Credit:

Linenberger, Mike

Publications:



Date:

2/9/2006

Index Date:

3/6/2006

DOE_office:

Notes:

High resolution digital file, ~22 MB

Subject:

solar-photovoltaics

Descriptors:

basic sciences, measurement, people and scientist, testing

Person/Place:

Jones, Kim; Golden, Colorado; NREL; SERF

Release Level

DOE Information:

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