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Adam F. Halverson - Postdoc

Photo of Adam F. Halverson
phone: 303-384-6703
email: Adam.Halverson@nrel.gov
At NREL since 2007

Adam Halverson’s scientific career began at Reed College where he received his BA in Physics in 2000 working under Dr. Nicholas A. Wheeler. After a year in the semiconductor industry, he matriculated at the University of Oregon in the physics department, ultimately joining the lab of Dr. J. David Cohen. In the Cohen lab, he used sophisticated measurements to study the electronic properties of disordered semiconductor thin films, particularly those used in thin-film solar cells. Characterization methods used included drive-level capacitance profiling (DLCP) and transient photocapacitance and transient photocurrent spectroscopies (TPC/TPI). These techniques were used to study the metastable effects of reverse bias stressing in CuInGaSe2 thin-film solar cells, as well as the effects of sulfur alloying in pentenary Cu(InxGa1-x)(SySe1-y)2 thin-film solar cells. These studies were focused on understanding the failure of the open-circuit voltage to scale with the bandgap.

Upon completion of his Ph.D. in Physics in 2007, Dr. Halverson joined the lab of Dr. Arthur Frank as a postdoctoral researcher in the Chemical Science and Nanoscience group at NREL.  His work at NREL is aimed at understanding fundamental transport and recombination processes in nanoporous and nanostructured materials. Such materials are commonly used as electrodes in sensitized solar cells.  

Other Team Members

Arthur J. Nozik

Matthew C. Beard

Matt Bergren

Helen E. Chappell

David C. Coffey

Smita Dayal

Randy J. Ellingson

Andrew J. Ferguson

Arthur J. Frank

Jianbo Gao

Brian A. Gregg

Alexander W Hains

Adam F. Halverson

Hugh W. Hillhouse

Roberta Hood

Barbara Hughes

Song-Rim Jang

Justin C. Johnson

Allison Kanarr

Soon Hyung Kang

Jae-Hun Kim

Jin Young Kim

Nikos Kopidakis

Ziqi Liang

Aaron Midgett

Nathan R. Neale

Matthew T. Rawls

Thomas H. Reilly III

Garry Rumbles

Octavi Escala Semonin

Danielle K. Smith

Jao van de Lagemaat

Michael Woodhouse

Kai Zhu